Plasma Active Implant Surface

Plasma Active – Plasma Implant Surface Activator

Plasma Active is the enhanced successor to Plasma X, offering a more powerful, faster, and longer‑lasting method for cleaning and activating implant surfaces. Thanks to its improved vacuum‑plasma technology, Plasma Active effectively removes hydrocarbons and restores the hydrophilicity of implants and abutments. The result: optimal initial stability, improved cell adhesion, and accelerated osseointegration. With increased cycle durability, reduced noise, and newly added Direct and Vortex modes, Plasma Active sets the new standard in modern implantology.

The benefits of the Plasma Active: 

✔ Effectively removes hydrocarbons to restore full hydrophilicity.
✔ Enhances initial stability and speeds up osseointegration.
✔ Offers higher durability with improved quality and reduced noise.
✔ Provides flexible use through both Direct and Vortex Modes.

XPEED®

MegaGen’s XPEED® surface treatment and Plasma Active form a powerful combination for achieving faster and more predictable osseointegration. XPEED® Active represents the ultimate advancement among existing surface treatments, faster than traditional S‑L‑A and capable of achieving up to twice the speed of osseointegration thanks to its Ca²⁺‑enriched surface that attracts phosphate ions and forms a biologically active apatite layer. This enhanced surface is further optimized when treated with Plasma Active, which removes hydrocarbons and restores full hydrophilicity for a clean, highly reactive implant surface. Together, they amplify protein adsorption, osteoblast proliferation, and early stability, creating ideal conditions for accelerated and highly reliable loading protocols.